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COO (Country of Origin):: BE

CRC Etching Chemical, Liquid Ferric Chloride Form, Novolack - 82009

This etching chemical is a liquid photo-positive resist designed for use in PCB production. Made from a composition of Novolack and O-Naphto-Chinon-Diazide, it effectively transfers patterns onto various substrates. The sensitive formulation allows for high precision in chemical etching processes, ensuring that electrical circuits remain intact after application.

Features & Benefits

• Resists strong acidic etching while allowing easy removal

• Maximum photo-sensitivity in the UV-A wavelength range

• Designed for application in dark or yellow light settings

• Suitable for both metal and glass lithographic projects

• Ensures accurate pattern transfer on circuit boards

• Enables effective etching of copper and brass materials

Applications

• Utilised for printed circuit board production

• Applied in photo-lithographic processes on metals

• Suitable for glass etching

• Used in creating durable inscriptions or graphics

How should surfaces be prepared before application?

Surfaces must be cleaned of grease and oxides, ideally using a water-based cleaning process, with final rinses in deionised water to ensure full wettability.

What is the recommended drying process after coating?

Post-coating, boards should be dried in the dark, with temperatures gradually raised to 70°C and maintained for 15 minutes to ensure optimal film quality.

How is the developing process carried out after exposure?

The exposed plate should be immersed in a sodium hydroxide bath for approximately 60 seconds to dissolve the exposed lacquer, followed by thorough rinsing in water.

Select all	Attribute	Value
	Brand	Kontakt Chemie
	Product Type	Etching Chemical
	Process Type	Etching
	Dispenser Type	Spray
	Material	Novolack
	Standards/Approvals	RoHS

	Select all
	Brand Kontakt Chemie
	Product Type Etching Chemical
	Process Type Etching
	Dispenser Type Spray
	Material Novolack
	Standards/Approvals RoHS

Kontakt Chemie 82009 Novolack Etching Chemical for Etching

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